Silicon Photonic wafer fabrication for education

Изготовление кремниевых фотонных пластин для образовательных целей
Michael L. Fanto, Stefan F. Preble, Sanjna Lakshminarayanamurthy, Nathan A. Rummage, Neville A. Mogent, Dale E. Ewbank, Jeffrey A. Steidle, Paul M. Thomas
2017-05-01

SOI waferSilicon photonicsTM-polarized grating couplersi-line lithographyring resonator
Silicon Photonics is a promising new technology for realizing efficient, high performance interconnects. There is a growing need for educating future engineers on how to design, fabricate, test and package Silicon photonic circuits. Here we demonstrate a Silicon photonic process suitable for an educational institution with i-line lithography capabilities. We have developed a suitable process for realizing passive photonic devices (i.e. waveguides, interferometric structures and fiber-chip grating couplers). The process is realized in a CMOS compatible environment which has been in use since 1986 to teach microelectronic engineering. And is now also being used to support the AIM Photonics Academy education mission. Specifically, an array of TM-polarized grating couplers with a ring resonator was fabricated with a lithographic resolution of 0.325 µm on an SOI wafer. The setup time and run time required was 3 days in comparison to the long wait time in the industry. Optimization of the resolution using ARC i-CON-7, diluted OiR 620 and the etch selectivity of the Silicon to the 1:1 OiR 620:PGMEA was key to the student run fabrication process and is supported by the Optical microscope and SEM results.
1
A CMOS-compatible silicon photonic fabrication process suitable for educational institutions with i-line lithography was developed.
2
An array of TM-polarized grating couplers with a ring resonator was fabricated at 0.325 µm lithographic resolution on an SOI wafer.
3
Optimization using ARC i-CON-7, diluted OiR 620, and a 1:1 OiR 620:PGMEA etch selectivity was key and validated by optical microscope and SEM results.
4
Student-run setup and run time for the fabrication was 3 days, significantly shorter than typical industry wait times.
5
The process realizes passive photonic devices: waveguides, interferometric structures, and fiber-chip grating couplers.

Silicon photonic wafer fabrication process for educational institutions (i-line lithography on SOI wafers producing passive photonic devices including waveguides, interferometric structures and grating couplers)

Development and optimization of a CMOS-compatible, student-run fabrication workflow (setup/run time, lithographic resolution 0.325 µm, ARC and resist dilution, etch selectivity) for realizing TM-polarized grating couplers and ring-resonator structures using optical microscope and SEM validation

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2017-05-01
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Michael L. Fanto
Stefan F. Preble
Sanjna Lakshminarayanamurthy
Nathan A. Rummage
Neville A. Mogent
Dale E. Ewbank
Jeffrey A. Steidle
Paul M. Thomas
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