Thermodynamic Analysis of ZrB 2 –SiC Oxidation: Formation of a SiC‐Depleted Region
Термодинамический анализ окисления ZrB2–SiC: образование обеднённой по SiC зоны
2006-10-24
SCID: 54.1/bfkhay3p
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SiC-depleted layerZrB2–SiC oxidationactive vs passive oxidationoxygen partial pressure (4.0×10^-14–1.8×10^-11 Pa)silica-rich layer
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Abstract (AI)
A thermodynamic model was developed to explain the formation of a SiC‐depleted layer during ZrB 2 –SiC oxidation in air at 1500°C. The proposed model suggests that a structure consisting of (1) a silica‐rich layer, (2) a Zr‐rich oxidized layer, and (3) a SiC‐depleted zirconium diboride layer is thermodynamically stable. The SiC‐depleted layer developed due to active oxidation of SiC. The oxygen partial pressure in the SiC‐depleted layer was calculated to lie between 4.0 × 10 −14 and 1.8 × 10 −11 Pa. Even though SiC underwent active oxidation, the overall process was consistent with passive oxidation and the formation of a protective surface layer.
Key Findings
1
A thermodynamic model explains formation of a SiC-depleted layer during ZrB2–SiC oxidation in air at 1500°C.
2
Calculated oxygen partial pressure in the SiC-depleted layer ranges from 4.0 × 10−14 to 1.8 × 10−11 Pa.
3
Despite active oxidation of SiC locally, the overall oxidation behavior remains consistent with passive oxidation and protective surface layer formation.
4
SiC-depleted layer forms due to active oxidation of SiC within the composite.
5
Stable layered structure predicted: (1) silica-rich layer, (2) Zr-rich oxidized layer, and (3) SiC-depleted ZrB2 layer.
Research Object
ZrB2–SiC composite undergoing oxidation in air at 1500°C
Research Subject
Thermodynamic formation and stability of a silica-rich layer, a Zr-rich oxidized layer, and a SiC-depleted ZrB2 layer including oxygen partial pressure range causing SiC active oxidation during overall passive oxidation
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2006-10-24
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