Millimeter-Wave GaN HEMT for Power Amplifier Applications
Миллиметровый GaN HEMT для применения в усилителях мощности
2014-01-01
SCID: 54.1/erhapaxu
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Equivalent circuit modelInAlN/GaN HEMTLoad-pull measurementsMillimeter-wave GaN HEMTPower amplifier applications
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Abstract (AI)
Gallium nitride high electron mobility transistors (GaN HEMTs) were developed for millimeter-wave high power amplifier applications. The device with a gate length of 80 nm and an InAlN barrier layer exhibited high drain current of more than 1.2 A/mm and high breakdown voltage of 73 V. A cut-off frequency fT of 113 GHz and maximum oscillation frequency fmax of 230 GHz were achieved. The output power density reached 1 W/mm with a linear gain of 6.4 dB at load-pull measurements at 90 GHz. And we extracted equivalent circuit model parameters of the millimeter-wave InAlN/GaN HEMT and showed that the model was useful in simulating the millimeter-wave power performance. Also, we report a preliminary constant bias stress test result.
Key Findings
1
A preliminary constant-bias stress test was reported, without detailed reliability conclusions in the abstract.
2
An 80 nm-gate InAlN/GaN HEMT achieved drain current exceeding 1.2 A/mm and breakdown voltage of 73 V.
3
At 90 GHz load-pull measurements, the HEMT delivered 1 W/mm output power density with 6.4 dB linear gain.
4
Equivalent-circuit model parameters were extracted and shown useful for simulating millimeter-wave power performance.
5
The device reached a cutoff frequency of 113 GHz and maximum oscillation frequency of 230 GHz.
Research Object
Millimeter-wave InAlN/GaN high-electron-mobility transistor (GaN HEMT) for high-power amplifier applications
Research Subject
High-frequency and high-power performance, including drain current, breakdown voltage, fT, fmax, output power density, linear gain, equivalent-circuit modeling, and bias-stress behavior
Publication Details
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2014-01-01
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