An Efficient Venturi Scrubber System to Remove Submicron Particles in Exhaust Gas

Эффективная система скруббера Вентури для удаления субмикронных частиц из отходящих газов
Chuen‐Jinn Tsai, Chia‐Hung Lin, Yu-Min Wang, Cheng-Hsiung Hunag, Shou-Nan Li, Zong-Xue Wu, Feng-Cai Wang
2005-03-01

SiO2 particlesVenturi scrubbercondensational particle growthheterogeneous nucleationsubmicron particle removal
An efficient venturi scrubber system making use of heterogeneous nucleation and condensational growth of particles was designed and tested to remove fine particles from the exhaust of a local scrubber where residual SiH4 gas was abated and lots of fine SiO2 particles were generated. In front of the venturi scrubber, normal-temperature fine-water mist mixes with high-temperature exhaust gas to cool it to the saturation temperature, allowing submicron particles to grow into micron sizes. The grown particles are then scrubbed efficiently in the venturi scrubber. Test results show that the present venturi scrubber system is effective for removing submicron particles. For SiO2 particles greater than 0.1microm, the removal efficiency is greater than 80-90%, depending on particle concentration. The corresponding pressure drop is relatively low. For example, the pressure drop of the venturi scrubber is approximately 15.4 +/- 2.4 cm H2O when the liquid-to-gas ratio is 1.50 L/m3. A theoretical calculation has been conducted to simulate particle growth process and the removal efficiency of the venturi scrubber. The theoretical results agree with the experimental data reasonably well when SiO2 particle diameter is greater than 0.1 microm.
1
A venturi scrubber system combining heterogeneous nucleation and condensational growth was developed to remove submicron exhaust particles.
2
At a liquid-to-gas ratio of 1.50 L/m³, the venturi scrubber had a relatively low pressure drop of approximately 15.4 ± 2.4 cm H₂O.
3
Fine-water mist cooled high-temperature exhaust to saturation, growing submicron SiO₂ particles into micron-sized particles before scrubbing.
4
The system removed more than 80–90% of SiO₂ particles larger than 0.1 micrometers, with efficiency depending on particle concentration.
5
Theoretical simulations of particle growth and removal agreed reasonably well with experiments for SiO₂ particles larger than 0.1 micrometers.

Submicron SiO2 particles in high-temperature exhaust gas from a local scrubber abating residual SiH4

Particle growth by heterogeneous nucleation and condensational growth, and subsequent removal efficiency and pressure drop in the venturi scrubber system

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2005-03-01
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Chuen‐Jinn Tsai
Chia‐Hung Lin
Yu-Min Wang
Cheng-Hsiung Hunag
Shou-Nan Li
Zong-Xue Wu
Feng-Cai Wang
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