Periodic Poling of KTiOPO<sub>4</sub>: From Micrometer to Sub-Micrometer Domain Gratings
Периодическое поляризация KTiOPO4: от микрометровых до субмикрометровых решеток доменов
2006-09-01
SCID: 54.1/hbvfxzt2
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E-beam lithographyKTP periodic polingKTiOPO4Periodic polingdeep UV-laser lithographydomain broadeningdomain gratingsflux grown KTPselective polingsub-micrometer domain gratings
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Abstract (AI)
Abstract Some novel techniques to do periodic poling of KTP are described. Emphasis on ways to avoid domain broadening and merging of domains is presented with reference to the original properties of flux grown KTP. For sub-μm structures E-beam lithography and deep UV-laser lithography were used to pattern the samples, and chemical process to promote selective poling to obtain high quality domain gratings in up to 1 mm thick samples. Keywords: KTPperiodic polingdomain gratings
Key Findings
1
Demonstrated use of e-beam lithography and deep UV-laser lithography to pattern sub-micrometer (sub-μm) structures for poling.
2
Developed chemical processes to promote selective poling, enabling high-quality domain gratings in samples up to 1 mm thick.
3
Identified the influence of original properties of flux-grown KTP on domain broadening and merging and proposed mitigation approaches.
4
Presented novel techniques for periodic poling of KTiOPO4 (KTP) that focus on preventing domain broadening and domain merging.
Research Object
Periodic poling of potassium titanyl phosphate (KTiOPO4, KTP) to create domain gratings
Research Subject
Methods and process conditions to produce high-quality micrometer to sub-micrometer domain gratings in KTP—avoiding domain broadening and merging, using e-beam and deep-UV lithography and selective chemical poling in up to 1 mm thick samples
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2006-09-01
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