Nanocrystalline silicon thin film growth and application for silicon heterojunction solar cells: a short review
Рост тонких пленок нанокристаллического кремния и их применение в кремниевых гетеропереходных солнечных элементах: краткий обзор
2021-01-01
SCID: 54.1/r78tft2d
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carbon dioxide plasma treatmenthydrogen plasma treatmentnanocrystalline silicon thin filmsnc-Si:H filmssilicon heterojunction solar cells
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Abstract (AI)
:H films for SHJ cells are highlighted. Furthermore, hydrogen and carbon dioxide plasma treatments are emphasised as the critical process modification steps for augmenting the nc-Si:H films' optoelectronic properties to enhance the SHJ device performance with better carrier-selective interfaces.
Key Findings
1
Carbon dioxide plasma treatment is identified as another important modification for enhancing nanocrystalline silicon film performance.
2
Hydrogen plasma treatment is emphasized as a critical process modification for improving nanocrystalline silicon thin-film optoelectronic properties.
3
Improved film optoelectronic properties can enhance silicon heterojunction solar-cell performance by enabling better carrier-selective interfaces.
4
The review highlights nanocrystalline silicon thin films as materials for silicon heterojunction solar cells.
Research Object
nanocrystalline silicon thin films and silicon heterojunction solar cells
Research Subject
the effects of hydrogen and carbon dioxide plasma treatments on the optoelectronic properties of nc-Si:H films and the performance of carrier-selective interfaces in SHJ cells
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2021-01-01
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