SUNY Poly foundry process design kit: a unique design enablement platform for photonic integrated circuit design

Процессный набор проектировщика литейного производства SUNY Poly: уникальная платформа поддержки проектирования фотонных интегральных схем
Amir Begović, Gerald Leake, Amit Dikshit, Jin Wallner, Barton Bergman, M. Rakib Uddin, Lewis G. Carpenter, Yukta Timalsina, Chandra Casline Cotter, Nicholas M. Fahrenkopf, Christopher Baiocco, D.L. Harame
2022-03-04

AIM Photonics PDKAlbany NanoTech Complex 300mm foundryEPDAPDKSUNY Poly foundryalternate PIC design flowintegrated Electronic Photonic Design Automationonboard light sourcesphotonic integrated circuit designprocess design kitquantum photonicssensorssilicon photonicstelecom applications
A novel process design kit (PDK) offering providing seamless access to the Albany NanoTech Complex’s 300mm foundry with a mission to promote silicon photonics technology is demonstrated. Unlike traditional pure-play foundries, we have developed a framework that allows our PDKs to contain libraries developed by internal and external domain experts. In addition to integrated Electronic Photonic Design Automation (EPDA) platforms, our PDK is also released in an alternate PIC design flow that the lowers the cost barrier for organizations. Further, our PDKs target a broad application space that includes telecom as well emerging areas such as sensors and quantum photonics – all with the ability for onboard light sources. A PDK from American Institute of Manufacturing (AIM Photonics) will be discussed that demonstrates these features.
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A novel PDK provides seamless access to Albany NanoTech Complex’s 300mm foundry to promote silicon photonics technology.
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An AIM Photonics PDK implementation is presented to demonstrate these platform features.
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The PDK framework supports libraries developed by both internal and external domain experts, unlike traditional pure-play foundries.
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The PDK integrates with Electronic Photonic Design Automation (EPDA) platforms and is also released in an alternate PIC design flow that lowers cost barriers.
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The PDK targets a broad application space including telecom, sensors, and quantum photonics, and supports onboard light sources.

SUNY Poly process design kit (PDK) for the Albany NanoTech 300mm silicon photonics foundry

Design enablement platform features and capabilities including integrated EPDA support, multi-library framework (internal and external libraries), alternate low-cost PIC design flow, support for onboard light sources, and targeting of telecom, sensors, and quantum photonics applications demonstrated via an AIM Photonics PDK

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Publication Date
2022-03-04
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Authors
Amir Begović
Gerald Leake
Amit Dikshit
Jin Wallner
Barton Bergman
M. Rakib Uddin
Lewis G. Carpenter
Yukta Timalsina
Chandra Casline Cotter
Nicholas M. Fahrenkopf
Christopher Baiocco
D.L. Harame
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