Reliability and parasitic issues in GaN-based power HEMTs: a review

Abstract Despite the potential of GaN-based power transistors, these devices still suffer from certain parasitic and reliability issues that limit their static and dynamic performance and the maximum switching frequency. The aim of this paper is to review our most recent results on the parasitic mechanisms that affect the performance of GaN-on-Si HEMTs; more specifically, we describe the following relevant processes: (i) trapping of electrons in the buffer, which is induced by off-state operation; (ii) trapping of hot electrons, which is promoted by semi-on state operation; (iii) trapping of electrons in the gate insulator, which is favored by the exposure to positive gate bias. Moreover, we will describe one of the most critical reliability aspects of Metal-Insulator-Semiconductor HEMTs (MIS-HEMTs), namely time-dependent dielectric breakdown.