Gate Injection Transistor (GIT)—A Normally-Off AlGaN/GaN Power Transistor Using Conductivity Modulation

Tetsuzo Ueda, Yasuhiro Uemoto, Masahiro Hikita, Hiroaki Ueno, Hisayoshi Matsuo, Hidetoshi Ishida, Manabu Yanagihara, Tsuyoshi Tanaka, Daisuke Ueda
2007-01-01

SCID:  54.1/zffs3fbz
We have developed a normally-off GaN-based transistor using conductivity modulation, which we call a gate injection transistor (GIT). This new device principle utilizes hole-injection from the p-AlGaN to the AlGaN/GaN heterojunction, which simultaneously increases the electron density in the channel, resulting in a dramatic increase of the drain current owing to the conductivity modulation. The fabricated GIT exhibits a threshold voltage of 1.0 V with a maximum drain current of 200 mA/mm, in which a forward gate voltage of up to 6 V can be applied. The obtained specificON-state resistance ($R_{ \scriptstyle{\rm ON} } \cdot A$) and theOFF-state breakdown voltage ($\hbox{BV}_{\rm ds}$) are 2.6$\hbox{m}\Omega\cdot \hbox{cm}^{2}$and 800 V, respectively. The developed GIT is advantageous for power switching applications.
Publication Details
Publication Date
2007-01-01
Journal
Publisher
ISSN
Access Type
Author Information
Authors
Tetsuzo Ueda
Yasuhiro Uemoto
Masahiro Hikita
Hiroaki Ueno
Hisayoshi Matsuo
Hidetoshi Ishida
Manabu Yanagihara
Tsuyoshi Tanaka
Daisuke Ueda
Explore More Research
Use the citation graph to discover related papers and expand your research horizons.
Click any node to explore
Download PDF
100%