Negative Hall coefficient of ultrathin niobium in Si/Nb/Si trilayers

M. Kończykowski, C. L. Chien, I. Zaytseva, O. Abal’oshev, P. Dłużewski, W. Paszkowicz, L. Y. Zhu, Marta Z. Cieplak
2014-08-22

SCID:  54.1/zn3j5uzq
Detailed structural and transport characterization of ultrathin niobium films, as thin as 1.1 nm, reveals a change of the Hall coefficient sign from positive to negative in the thinnest films. This finding may have implications for understanding of disappearance of superconductivity in the ultrathin film limit.
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2014-08-22
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M. Kończykowski
C. L. Chien
I. Zaytseva
O. Abal’oshev
P. Dłużewski
W. Paszkowicz
L. Y. Zhu
Marta Z. Cieplak
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