Mechanistic difference between Si-face and C-face polishing of 4H–SiC substrates in aqueous and non-aqueous slurries

Lin Lin, Haibo Chen, Juanfen Shen, Jiapeng Chen, Yunyun Gu, Zhenlin Jiang, Jun Li, Tao Sun
2022-10-17
SCID:  54.1/zv35xpke
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2022-10-17
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Lin Lin
Haibo Chen
Juanfen Shen
Jiapeng Chen
Yunyun Gu
Zhenlin Jiang
Jun Li
Tao Sun
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