Nonvolatile programmable silicon photonics using an ultralow-loss Sb 2 Se 3 phase change material

Неволатильная программируемая кремниевая фотоника с использованием фазопереходного материала Sb2Se3 со сверхнизкими оптическими потерями
David J. Thomson, Daniel W. Hewak, Xingzhao Yan, Han Du, Mehdi Banakar, Otto L. Muskens, Matthew Delaney, Ioannis Zeimpekis
2021-06-16

Mach-Zehnder interferometernanophotonic digital patterningnonvolatile programmable silicon photonicsoptical phase controlultralow-loss Sb2Se3 phase change material
facilitates an unprecedented optical phase control exceeding 10π radians in a Mach-Zehnder interferometer. To demonstrate full control over the flow of light, we introduce nanophotonic digital patterning as a previously unexplored conceptual approach with a footprint orders of magnitude smaller than state-of-the-art interferometer meshes. Our approach enables a wealth of possibilities in high-density reconfiguration of optical functionalities on silicon chip.
1
An ultralow-loss Sb₂Se₃ phase-change material enables nonvolatile, programmable silicon photonics.
2
Nanophotonic digital patterning is introduced to control light flow using a footprint orders of magnitude smaller than state-of-the-art interferometer meshes.
3
The approach achieves unprecedented optical phase control exceeding 10π radians in a Mach–Zehnder interferometer.
4
The method enables high-density reconfiguration of optical functionalities on silicon chips.

nonvolatile programmable silicon photonics using ultralow-loss Sb2Se3 phase-change material

optical phase control and high-density reconfiguration of light-flow functionalities on a silicon chip

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Publication Date
2021-06-16
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Authors
David J. Thomson
Daniel W. Hewak
Xingzhao Yan
Han Du
Mehdi Banakar
Otto L. Muskens
Matthew Delaney
Ioannis Zeimpekis
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