P-Type Conduction in Mg-Doped GaN Treated with Low-Energy Electron Beam Irradiation (LEEBI)
Р-тип проводимости в Mg-легированном GaN, обработанном низкоэнергетическим электронным пучком (LEEBI)
1989-12-01
SCID: 54.1/xtcu69pj
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Hall effect measurementMg-doped GaNlow-energy electron beam irradiation (LEEBI)p-n junction LEDp-type conduction
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Abstract (AI)
Distinct p-type conduction is realized with Mg-doped GaN by the low-energy electron-beam irradiation (LEEBI) treatment, and the properties of the GaN p-n junction LED are reported for the first time. It was found that the LEEBI treatment drastically lowers the resistivity and remarkably enhances the PL efficiency of MOVPE-grown Mg-doped GaN. The Hall effect measurement of this Mg-doped GaN treated with LEEBI at room temperature showed that the hole concentration is ∼2·10 16 cm -3 , the hole mobility is ∼8 cm 2 /V·s and the resistivity is ∼35 Ω·cm. The p-n junction LED using Mg-doped GaN treated with LEEBI as the p-type material showed strong near-band-edge emission due to the hole injection from the p-layer to the n-layer at room temperature.
Key Findings
1
A p–n junction LED using LEEBI-treated Mg-doped GaN as the p-type layer exhibits strong near-band-edge emission at room temperature due to hole injection.
2
Hall measurements at room temperature after LEEBI show hole concentration ≈ 2·10^16 cm^-3, hole mobility ≈ 8 cm^2/V·s, and resistivity ≈ 35 Ω·cm.
3
LEEBI treatment drastically lowers resistivity and remarkably enhances photoluminescence (PL) efficiency of Mg-doped GaN.
4
Low-energy electron-beam irradiation (LEEBI) treatment of MOVPE-grown Mg-doped GaN produces distinct p-type conduction.
Research Object
Mg-doped GaN treated with low-energy electron-beam irradiation (LEEBI)
Research Subject
Realization and characterization of p-type conduction and related electronic/optical properties (hole concentration, mobility, resistivity, enhanced photoluminescence) and performance of a p-n junction LED using the LEEBI-treated Mg-doped GaN as the p-type layer
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1989-12-01
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